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Tunable diode laser absorption spectroscopy (TDLAS)

A laser-based optical technique to detect and measure the concentration of impurities in process gas streams to boost your plant safety and efficiency

TDLAS provides on-line, real-time measurements of impurities in process gas streams with low parts-per-million sensitivity. The technology is widely used by gas plant operators for measurements of moisture (H2O), carbon dioxide (CO2), hydrogen sulfide (H2S), and more in gas processes and pipelines. By delivering accurate and robust measurements with fast response times, TDLAS offers higher plant safety, efficiency, and availability with low cost of operation.​

JT33 TDLAS H2S analyzers with enclosures for Oil & Gas markets ©Endress+Hauser

JT33 TDLAS gas analyzers

Product picture of three: J22 TDLAS panel mount, enclosure box, J22 gas analyzer ©Endress+Hauser

J22 TDLAS gas analyzers

Installation picture of SS2100 at a gas plant, customer site, landscape view ©Endress+Hauser

SS2100 TDLAS analyzer installed

Group shot of TDLAS gas analyzers, SS2100, SS2100I-1, H2S ©Endress+Hauser

SS2100 and SS2100I-1 TDLAS analyzers

SS500 single channel H2O, TDLAS gas analyzer, right angle view ©Endress+Hauser

SS500 TDLAS analyzer

Fördelar

  • Offers robust, reliable, and extremely fast analyte measurements

  • Helps prevent pipeline corrosion and minimizes explosion risk, ensuring human safety and asset integrity

  • Improves process efficiency and plant availability by avoiding shut-in, flaring, and interrupted gas delivery incidents

  • Resists interferences or detrimental effects from compressor oil, glycol, methanol, amine, H2S or moisture slugs, guaranteeing continuous gas deliveries and eliminating transfer disputes

  • Allows for a compact, low maintenance analyzer design for low overall cost of ownership​

Endress+Hauser pioneered the use of TDLAS analyzers to detect and measure the concentration of analyte molecules (such as H2O, H2S, and CO2) in process gas streams. Our expertise in this field is underscored by our extensive portfolio of patents. Recent advances in semiconductor lasers have made the development of TDLAS for process gas monitoring applications even more technologically and economically viable today.

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